ГОСТ ISO/TS 80004-8—2016
ion beam etching
7.3.13
ion beam milling
7.3.13
ion beam surface reconstruction
5.3
*on implantation
*on induced deposition
»on induced etching
ion projection lithography
isotropic etching
Langmuir — Blodgett film formation
Langmuir — Blodgett film transfer
laser ablation
layer-by-layer deposition
LbL
LbL deposition
light-assisted etching
liquid precursor combustion
lithography
magnetic driven assembly
micro-contact printing
microfluidic deposition
modulated elemental reacted method
molecular beam epitaxy
multilayer deposition
multilayer film process
multi-pass coin forging
nanocomposite
nano-embossing
nanofabrication
nanofibre
nanofibre precipitation
nano-imprint lithography
nanomanufacturing
nanomanufacturing process
nanomaterial
nano-object
nanoparticle
nanopartide dispersion
nanopartide predpitation
nanopartide sintering
nanopartide spray coating
nanoscale
nanostructured material
nanotemplated growth
nanotube
6.5.8
7.1.12
7.1.13
7.1.14
7.3.14
5.4
5.5
7.3.15
5.6
7.2.15
5.6
7.3.16
6.2.1.1
3.6
4.4
7.1.15
7.1.16
5.7
7.2.13
3.7
7.4.2
6.5.10
2.2
7.1.17
3.8
2.3
7.4.3
7.1.18
3.9
3.10
2.4
2.5
2.6
6.3.3
6.4.2
6.5.13.2
7.4.4
2.7
2.8
6.5.11
2.9
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