ГОСТ Р 56662—2015
Ion beam milling
7.3.13
Ion beam surface reconstruction
5.3
Ion implantation
6.5.8
Ion induced deposition
7.1.12
Ion induced etching
7.1.13
Ion projection lithography
7.1.14
Isotropic etching
7.3.14
Langmuir-Btodgett film formation
5.4
Langmuir-Blodgett film transfer
5.5
laser ablation
7.3.15
layer-by-layer deposition
5.6
LbL
7.2.15
LbL deposition
5.6
light-assisted etcheig
7.3.16
liquid precursor combustion
6.2.1.1
lithography
3.6
magnetic driven assembly
4.4
micro-contact printing
7.1.15
microfluidic deposition
7.1.16
modulated elemental reacted method
5.7
molecular beam epitaxy
7.2.13
multilayer deposition
3.7
multilayer film process
7.4.2
multi-pass coin forging
6.5.10
nanocomposite
2.2
nano-embossing
7.1.17
nanofabrication
3.8
nanofibre
2.3
nanoflbre precipitation
7.4.3
nano-imprlnt lithography
7.1.18
nanomanufacturing
3.9
nanomanufactunng process
3.10
nanomaterial
2.4
nano-object
2.5
nanoparticle
2.6
nanoparticle dispersion
6.3.3
nanoparticle precipitation
6.4.2
nanoparticle sintering
6.5.13.2
nanoparticle spray coating
7.4.4
nanoscale
2.7
nanostructured material
2.8
nanotemplated growth
6.5.11
nanotube
2.9
natural lithography
7.1.19
NIL
7.1.18
optical lithography
7.1.20
26