ГОСТ Р ИСО 14644-10—2014
Библиография
[1]
ISO 14644-8
Cleanrooms and associated controBed environments — Part 8: Classification of air cleanli
ness by chemical concentration
(2]
ISO 14644-9
Cleanrooms and associated controlled environments — Part 9: Classification on surface
cleanliness by particle concentration
[3]
ISO 18115-1
Surface chemical analysis — Vocabulary — Part 1: General terms and terms used in spec
troscopy
[4]
ISO 17052
Rubber, raw — Determination of residual monomers and other volatile low-molecular-mass
compounds by capillary gas chromatography — Thermal desorption (dynamic headspace)
method
[5]
ISO 18116
Surface chemical analysis — Guidelines for preparation and mounting of specimens for
analysis
[6]
ISO 10312
Ambient air — Determination of asbestos fibres — Direct transfer transmission electron mi
croscopy method
17]
JACA 43
Standard for evaluation methods on substrate surface contamination in cleanrooms and as
sociated controlled environments
[8]
SEMI E46-0307
Test method for the determination of organic contamination from minienvironments using
ion mobility spectrometry (IMS)
[9]
Fujimoto T.. Takeda K.. Nonaka T. Airborne Molecular Contamination: Contamination on Substrates and the
Environment in Semiconductors and Other Industries. In: Developments in Surface Contamination and Clean
ing: Fundamentals and Applied Aspects. (Kohli R. & Mittal K. L. eds.). WHIiam Andrew Publishing, Norwich.
New York. 2007. pp. 329^174.
[10]Birch W.. Carre A., Mittal K.L. Wettability in Surface Contamination and Cleaning. In: Developments in Surface
Contamination and Cleaning: Fundamentals and Applied Aspects. (Kohli R. & Mittal K. L. eds.). William Andrew
Publishing. Norwich. New York. 2007. pp. 693-724.
[11]Fujimoto T„ Nonaka T.. Takeda K. et al. Study on Airborne Molecular Contaminants in Atmosphere and on
Substrate Surfaces. Proceedings of the fS1’ ICCCS. Beijing: International Symposium on Contamination Con
trol. 2006
[12]Beckhoff B.. Fabry L. et al. Ultra-Trace Analysis of Light Elements and Speciation of Minute Organic Contami
nants on Silicon Wafer Surfaces by Means of TXRF in Combination with NEXFS. Proceedings of ALTECH
2003 (Analytical Techniques for Semiconductor Materials and Process Characterization IV). 203r’3Electrochem
ical Society Meeting, Paris. 27 April — 2 May. 2003
[13]Wang J. & Baiazs M. et al. How Low Can the Detection Limit Go with VPD-TXRF? Proceedings of the 2001
SPWCC (Semiconductor Pure Water Chemical Conference). 362-369. Pennington. New Jersey: The Electro
chemical Society. 2001
[14]JIS К 0311:2005 Method for determination of tetra- through octa-chlorodibenzo-p-dioxins. tetra- through
octa-chlorodibenzofurans and со-planar polychlorobiphenyls in stationary source emissions
[15]Evans K. & Anderson T. A. Instrumental analysis techniques. In: Microelectronics Failure Analysis: Desk Ref
erence. (Electronic Device Failure Analysis Society Desk Reference Committee, ed.) ASM International. Mate
rials Park. Ohio. Fourth Edition. 1999. pp. 343-51.
[16]Vanderlinde W. Energy dispersive X-ray analysis. In: Microelectronics Failure Analysis: Desk Reference. (Elec
tronic Device Failure Analysis Society Desk Reference Committee, ed.). ASM International. Materials Park,
Ohio. Fifth Edition. 2004. pp. 628-39.
[17]Budde K., & Holtzapfel W. Determination of Contaminants on Substrate Surface Using IMS/MS and GC/MS.
Proceedings of SEMICON Europa (1997 and 2000. Munich. Germany). San Jose. California: SEMI. 2000
[18]Chia V. K. F.. & Edgeil M. J. On-Water Measurement of Molecular Contaminants. In: Contamination-Free Man
ufacturing for Semiconductors and Other Precision Products. (Donavan R. P. ed.). M. Dekker Press, New York.
2001, 117-48.
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